Materials Letters 57 (2003) 2253 – 2257 www.elsevier.com/locate/matlet

Conduction mechanism in plasma polymerized aniline thin films C. J. Mathai a, S. Saravanan a, S. Jayalekshmi a, S. Venkitachalam b, M.R. Anantharaman a,* a

Department of Physics, Cochin University of Science and Technology, Cochin 682 022, India b Sci/Engr.SG, PCM, VSSC, Trivandrum 695 022, India Received 13 July 2002; accepted 5 August 2002

Abstract Electrical properties of ac plasma polymerized aniline thin films are investigated with a view of determining the dominant conduction mechanism. The current – voltage (I – V) characteristics in symmetric and asymmetric electrode configuration for ˚ are investigated. From the studies on asymmetric electrode polyaniline thin films in the thickness range from 1300 to 2000 A configuration, it is found that the dominant conduction mechanism in these films is of Schottky type. D 2002 Elsevier Science B.V. All rights reserved. Keywords: Plasma polymerization; Polyaniline; Thin film; Conduction mechanism; Schottky mechanism

1. Introduction Chemical and electrochemical polymerizations are common methods used to obtain polyaniline thin films on metallic electrodes [1,2]. However, the technique of plasma polymerization is increasingly being used as an alternative for obtaining polymer thin films [3]. Polymer thin films obtained by plasma polymerization technique are different from those obtained by the conventional technique. Unlike the films obtained by chemical or electrochemical methods, plasma polymer films are pinhole-free, chemically inert, of uniform thickness and thermally stable [4]. Electronic and photonic properties of polyaniline have attracted considerable research interest due to its

potential applications in a wide range of fields such as LEDs, intermetallic dielectric, EMI shielding and in anticorrosion protection layers. Most of the published literature deals with polyaniline prepared by chemical methods. Articles relating to plasma polymerized aniline are less abundant in literature. A few of them relating to plasma polymerized polyaniline are all synthesized by rf plasma [5– 7]. The ac plasma polymerization is an effective method for the preparation of polymer thin films. This study particularly focuses on the electrical properties of ac plasma polymerized aniline thin film. This is carried out with a view of determining the dominant conduction mechanism.

2. Experimental * Corresponding author. Tel.: +91-484-540-404x30; fax: +91484-532-495. E-mail address: [email protected] (M.R. Anantharaman).

Polyaniline thin films are prepared by ac plasma polymerization technique and the details of this tech-

0167-577X/02/$ - see front matter D 2002 Elsevier Science B.V. All rights reserved. doi:10.1016/S0167-577X(02)01205-3

2254

C.J. Mathai et al. / Materials Letters 57 (2003) 2253–2257

nique are cited elsewhere [8]. These thin films of polyaniline are then transferred with appropriate masks into a conventional metal-coating unit for coating the second electrode (Al/Au/Ag) under a pressure of 7  10 6 Torr. These films are in the form of metal/ polymer/metal of cross-sectional area 2.5  10 5 m2. The thickness of the polymer films is measured by interferometric technique (Tolansky technique) and the ˚. thickness values lie in the range from 1300 to 2000 A These sandwich samples are placed in a home-built conductivity cell to investigate the dependence of current density on voltage, temperature and thickness. A bias voltage in the range from 1 to 40 V is applied and the current flowing across the sample is measured by a Keithley Picoammeter/Voltage source (Model 487). All the measurements are carried out under dynamic vacuum. The data acquisition and analysis of the data are completely automated by employing the LabVIEW software (National Instruments).

3. Results and discussion 3.1. J – V studies on symmetric electrode configuration Fig. 1 shows a typical room temperature J– V plot ˚ . The plot of polyaniline thin film of thickness 1350 A

Fig. 2. Thickness dependence on the current density for Al/ polyaniline/Al thin film at room temperature.

consists of two regions, in the lower range of the applied voltage, the slope is around 1, and in the higher range, the slope is 2.3. The conduction in the lower region of the applied voltage is found to be ohmic while in the higher range of the applied field, it is found to be non-ohmic. There are three different types of conduction mechanisms, namely, space charge limited conduction (SCLC), Schottky-type conduction and Poole – Frenkel conduction mechanism [9], and one of these mechanisms will be dominant in a given sample. According to SCLC theory [9], the thickness (d) dependence of the space charge limited current follows the relation of Jad n, where n is a parameter which depends on the trap distribution and is equal to or greater than three in the presence of traps. Fig. 2 shows the dependence of thickness on the current density for polyaniline films and it is found that the current density varies as d  1.85 . The value of n f 1.85 is less than that required for space charge limited conduction and so SCLC conduction mechanism is ruled out. A general expression that holds equally well for both types (Schottky and Poole –Frenkel) of conduction mechanism is of the form [10] 

Fig. 1. Current density against applied voltage for Al/polyaniline/Al ˚ in thickness at room temperature. film of 1350 A

 bF 1=2  / J ¼ J0 exp ; kT

ð1Þ

C.J. Mathai et al. / Materials Letters 57 (2003) 2253–2257

where / is the barrier height of electrode –polymer interface, T is the absolute temperature, k is the Boltzmann constant, F is the electric field given by F = V/d, where V is the applied voltage and d the thickness of the sample and the constant b is given by  b¼

e3 apee0

2255

Table 1 Experimental and calculated values of b coefficients Film Experimental b Theoretical bs Theoretical bPF thickness (eV m1=2 V 1=2) (eV m1=2 V 1=2) (eV m1=2 V 1=2) ˚) (A 3.21  10 5

1350

2.82  10 5

5.64  10 5

 12 ;

ð2Þ

where the coefficient a = 1 for Poole –Frenkel effect and a = 4 for Schottky emission, e is the dielectric constant and e0 is the permittivity of free space. According to Eq. (1), a plot of log J versus V1=2 should yield a straight line if either of the above mentioned two mechanisms are dominant in plasma polymerized aniline thin films. Fig. 3 shows the log J versus V1=2 plot for plasma polymerized aniline thin ˚ . This further confirms that film of thickness 1350 A the conduction mechanism in polyaniline thin films is due to either Poole – Frenkel or Schottky. To differentiate between the two conduction mechanisms is to compare the theoretical and experimental values of the b coefficients. The experimental value of b (bexp = akTd1=2) is obtained from the slope (a) of the linear portion of log J versus V1=2 plot and the theoretical coefficients bs and bPF are calculated by using Eq. (2). Dielectric constant (e) of plasma polymerized aniline film at high frequency is estimated

from the optical transmission studies in the near IRvisible region and the value is found to be 1.81. This value of dielectric constant is substituted in Eq. (2) to calculate the theoretical b values and is given in Table 1 along with the experimentally obtained b value. A comparison of the values of the experimental and theoretical b coefficients indicates that in plasma polymerized aniline thin films, the b coefficient value agrees well with the Schottky-type conduction mechanism. However, reports indicate that the mere coincidence of theoretical and experimental b coefficients is not sufficient to establish the dominance of either of the mechanisms [11,12]. Thus, to confirm the dominance of the Schottky-type conduction mechanism in polyaniline thin films, J –V studies for asymmetric electrode configurations are also carried out. These results are discussed below. 3.2. J– V studies for asymmetric electrode configurations Equation for Schottky effect is given by [9] 

b F 1=2  / J ¼ AT exp s kT 2

Fig. 3. Schottky plot for Al/polyaniline/Al polymer thin film of ˚. thickness 1350 A

 ð3Þ

from the above equation, it is clear that the current depends exponentially on the barrier height /. Thus, in an asymmetric electrode configuration, the current should also be asymmetric when the bias polarity is reversed. Fig. 4 shows a typical J– V1=2 plot obtained for Au/polyaniline/Al asymmetric electrode configu˚ . The two ration for a sample thickness of 1350 A curves in the plot indicate the two directions of the applied field. The difference between the work functions of the two metal electrodes in Au/polyaniline/Al asymmetric electrode configuration is about 0.82 eV and hence many orders of change should be observed in the current density values for opposite directions of the applied field. However, the difference in the current

2256

C.J. Mathai et al. / Materials Letters 57 (2003) 2253–2257

density values for opposite polarities of the applied field in Au/polymer/Al asymmetric electrode configuration is quite small as observed in Fig. 4. This small difference in the current density values may be due to the effects of surface states present at the polymer electrode interface, which can change the potential barrier [13]. The difference in the current density values for opposite directions of the applied field, though small, can hence be considered as favouring an electrode-dependent Schottky-type conduction in polyaniline films. The different slopes of the two curves in Fig. 4 for opposite polarizations of the asymmetric electrode configuration clearly indicate that barrier heights play a significant role in the conduction process. 3.3. Activation energy For Schottky-type conduction mechanism, Eq. (3) requires that the plots of ln( J/T2) versus (1/T) for different values of the applied bias voltages should be linear. The activation energies can be obtained from the slopes of the linear portions of ln( J/T2) against (1/ T) plots that are shown in Fig. 5 for Al/polyaniline/Al ˚ . As observed in Fig. 5, the of film thickness 1350 A plot yields a straight line, which further confirms that the Schottky-type conduction mechanism is dominant

Fig. 5. Plot of ln( J/T2) against 1000/T for Al/polyaniline/Al structure ˚ for different applied bias voltages. of film thickness 1350 A

in the ac plasma polymerized aniline thin film [14]. The activation energy is found to decrease from 0.73 to 0.65 eV as the biased voltage increases from 5 to 11 V.

4. Conclusion Polyaniline thin films of different thickness are prepared by ac plasma polymerization technique. Asymmetric electrode configuration studies show that barrier heights play a significant role in the conduction process. It is found that conduction is an activated process with activation energy decreasing from 0.73 to 0.65 eV as the bias voltage is increased. From the above observations, it can be inferred that electrode limited Schottky-type conduction is dominant in plasma polymerized polyaniline thin films.

Acknowledgements

Fig. 4. Schottky plot for Au/polyaniline/Al asymmetric electrode configuration at room temperature.

M.R.A. thanks Indian Space Research Organization (ISRO) for the financial assistance received in the form of a project under ‘‘RESPOND PROJECT’’. S.J. acknowledges the financial support received under a UGC minor research project. C.J.M. thanks CUSAT for the fellowship.

C.J. Mathai et al. / Materials Letters 57 (2003) 2253–2257

References [1] C.H. McCoy, I.M. Lorkoviv, M.S. Wrighton, J. Am. Chem. Soc. 117 (1995) 6934. [2] M. Karakisla, M. Sacak, U. Akbulut, J. Appl. Polym. Sci. 59 (1996) 1347. [3] H. Yasuda, Plasma Polymerization, Academic Press, New York, 1985. [4] N.P. Chermisinoff, Handbook of Polymer Science and Technology, vol. 4, Marcel Dekker, New York, 1989. [5] N.V. Bhat, N.V. Joshi, Plasma Chem. Plasma Process. 14 (1994) 151. [6] G.J. Cruz, J. Morales, M.M. Castillo-Orgtega, R. Olayo, Synth. Met. 88 (1997) 213.

2257

[7] U. Gong, L. Dai, A.W.H. Mau, H.J. Griesser, J. Polym. Sci., A, Polym. Chem. 36 (1998) 633. [8] C. Joseph Mathai, S. Saravanan, M.R. Anantharaman, S. Venkitachalam, S. Jayalekshmi, J. Phys., D. Appl. Phys. 35 (2002) 240. [9] D.R. Lamb, Electrical Conduction Mechanisms in Thin Insulating Films, Methuen, London, 1967. [10] B. Thomas, M.G. Krishna Pillai, S. Jayalekshmi, J. Phys. D Appl. Phys. 21 (1988) 503. [11] H. Carchano, M. Valentin, Thin Solid Films 30 (1975) 335. [12] J. Antula, Solid-State Electron. 14 (1971) 643. [13] T. Mizutani, Y. Taki, T. Osawa, M. Ieda, J. Phys., D. Appl. Phys. 9 (1976) 2253. [14] D. Sakthi Kumar, J. Mater. Sci. 35 (2000) 4427.

Conduction mechanism in plasma polymerized aniline ...

used as an alternative for obtaining polymer thin films ... Articles relating to plasma polymerized ani- .... The activation energy is found to decrease from 0.73 to.

104KB Sizes 5 Downloads 144 Views

Recommend Documents

Plasma polymerized TEOS films for
tel: 00 213 079632647, email : [email protected]. Received: February 18 ... Concerning the selectivity, the results revealed a good affinity of the layer to methanol ...

Low k thin films based on rf plasma-polymerized aniline
May 17, 2004 - Thermally stable materials with low dielectric constant (k < 3.9) are being hotly ... dielectrics in integrated circuit technology, which reduces parasitic capacitance ... finding alternative methods to prepare low dielectric constant

Low k thin films based on rf plasma-polymerized aniline
May 17, 2004 - Online at http://www.njp.org/ ... candidates for fabricating Schottky devices, storage batteries, LEDs, sensors, super capacitors and for EMI ...

Photoluminescence studies on RF plasma-polymerized ...
Nov 15, 2005 - FTIR have been recorded on the pristine and silicon ion irradiated polymer thin .... (2) formation of radiation induced defects leading to non-.

Lateral Ionic Conduction in Planar Array Fuel Cells
A performance degradation phenomenon is observed in planar array fuel cells. This effect occurs when .... Thus, there are no lateral potential gradients to drive the flow of an ... As this potential difference was ramped from 0 V to. 10 V, the .... d

Strain induced non-linear conduction in epitaxial La0 ...
The conductance data for all the films have been ... and 300 K. I-V measurements show similar behaviour .... support in the form of Center of Excellence (CE).

Strain induced non-linear conduction in epitaxial La0 ...
electron from Jahn-Teller (JT) Mn3+ ion to non-JT. Mn4+ ion8, while the .... project sanctioned by GUJCOST, Gandhinagar, India. References. 1 Rao C N R ...

complex plasma phenomena in the laboratory and in ...
D.D. Ryutov (LLNL, USA). B. Coppi (MIT, USA). A. Macchi (CNR/INO, Pisa, Italy). P.M. Bellan (Caltech, USA). R.V.E. Lovelace (Cornell University, USA). R. Alexander (University of Leicester, UK). A. Johansen (Lund Observatory, Sweden). G.E. Morfill (M

Development of environmental management mechanism in Myanmar
Jun 17, 2008 - the effort to keep a balance between development and environment, Myanmar has made efforts and will ..... 4.4.6 Application management.

Incentives in the Probabilistic Serial Mechanism - CiteSeerX
sity house allocation and student placement in public schools are examples of important assignment ..... Each object is viewed as a divisible good of “probability shares.” Each agent ..... T0 = 0,Tl+1 = 1 as a technical notation convention. B.2.

Long connected plasma column in air produced by ... - CiteSeerX
lead to the formation of connected plasma channels over several meters. Optical and electric diagnostics and simulations allow characterization of the plasma ...

Bradydysrhythmias and Atrioventricular Conduction ...
E-mail address: [email protected] (J.W. Ufberg). 0733-8627/06/$ - see front matter © 2005 Elsevier Inc. All rights reserved. doi:10.1016/j.emc.2005.08.

Evaluation of plasma damage in blanket and patterned ...
low-k agree well with the FTIR and water source ellipsometric porosimetry (WEP) ... be used for the real-time process optimization and monitoring. Therefore, it is ...

Direct Plasma Sample Injection in Multiple ... - Jonathan D. Gough
Stine Haskell Research Center, DuPont Pharmaceuticals Company, P.O. Box 30, Newark, ..... computer with Masslynx 3.2 (Micromass) software was used to.

pdf-27\plasma-homovanillic-acid-in-schizophrenia-implications-for ...
"The British Journal of Psychiatry". "The authors of this book make a good case for the measurement of plasma homovanillic acid as. the best available approach to test theories concerning the role of DA in the etiology and treatment. of schizophrenia

What is welding - Arcraft Plasma
HCP. 17 . Metal with highest resistivity and lowest conductivity a. copper b. iron c. nickel d. Titanium. 18 . Susceptibility to stress corrosion cracking is generally less in a. High purity metal b. Martensitic microstructure c. High CE alloys d. HS

Oxygen chemiluminescence in He plasma as a method ...
We propose a method for evaluating the hydrophilisation degree of low-k films upon ... The presented method gives a unique opportunity to assess the degree of ...

Determination of Codeine in Human Plasma and Drug ...
PM-80 solvent delivery system, a Rheodyne Model 7125 sample injection valve (20 mL ... the content of codeine in real samples. Human plasma was ... SW voltammograms for 10 mM codeine in 0.05 M HClO4 solution at a bare GCE (a), the ...

Quark-Gluon Plasma
Large acceptance, high DAQ rate detectors with good particle ID. • Realistic lattice QCD for thermo- dynamic quantities. • Realistic transport codes. • Weak (pQCD) and strong (AdS/CFT) coupling dynamical models. • Multivariate model-data comp