Stead-State Temperature Stability: ±2 ºC Heating Rate: 0-200 ºC per second, user-controllable Cooling Rate: Temperature dependent, max. 150 ºC per second Maximum Non-Uniformity: Radiant Flux: ±0.25% Sheet Resistivity: Uniformity ≤2% (dose monitoring units) (Post-anneal sheet resistivity measured on a 150mm wafer annealed at 1100 ºC for 10 seconds) Implant: As, 1016, 50KeV, with implant uniformity ≤0.3% Steady State Time: 1-9999 sec. (1-600 sec recommended) Wafer Sizes for the RTP-600S: 2”, 3”, 4”, 5”, 6”, and smaller pieces
PRE-OPERATION 1. 2. 3. 4.
Sign-in the log-book. Turn on the chiller. After start-up procedure is finished, press the START key. Open AIR gas valve, and any necessary process gasses (currently, N2 only) Turn the key on front panel of RTP to the right and press EMO Reset button – this turns the entire system on. Once the computer boots up, the system Main Menu should appear on the monitor screen. If it does not, check that the monitor is on. Press the Power ON button – this enables the heating unit. The RTP-600S system now is ready for operation.
OPERATION 5. Press F3 to create a new recipe or modify an existing recipe. See Chapter 2 of operating manual for recipe programming. 6. Press F4 to run the recipe. POWER-DOWN PROCEDURE 7. Press the “Power Off” button. 8. Quit the RTP-600S program by typing Q (Quit) from the Main Menu 9. Turn the key to the left – this will turn the whole system off 10. Close all gas valves. 11. Turn off the chiller 12. Sign-out the log-book.
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